Dear my colleagues;

Following the first and second SFM at Shandong University, China and the third at Gunma University, Japan, the 4th International Symposium on Silsesquioxanes-based Materials (SFM 20) will be held at Pusan National University, Busan, Korea on July 29-30, 2020. 
We would like to invite all of you to attend at the SFM20 to share our common interests on the research and development of silica or silesquioxane based materials. 
Please mark the dates in your calendar. 
We will let you know more details whenever organization stuffs for the SFM20 are ready.
As of today, the following eminent scientists (in ABC order of the names) were confirmed to give invited talks;

• Prof. Richard Laine (University of Michigan, USA) 
• Prof. Hongzhi Liu (Shandong University, China) 
• Dr. Michel Wong Chi Man (Ecole Nationale Supérieure de Chimie de Montpellier, France) 
• Prof. Masafumi Unno (Gunma University, Japan) 
• Prof. Ulich Wisner (Cornell University, USA) 

The list of invited speakers will be updated with more experts on the silsesquioxane based materials. 
Though we will let you know more details on the SFM20 how to submit your abstract and register, etc. via a web site whenever it is ready, we will be happy if you could send us a line on your tentative plan whether you can join to the SFM20. Then it would be very helpful for the successful organization of the SFM20. 
Also, may we ask you to recommend the SFM20 to your colleagues or neighbors to join the wonderful symposium? 

We are looking forward to seeing each of you at Busan, Korea in next July. 

Best regards 

Ha, Chang-Sik 

Chairperson of the SFM20 
Dept. of Polymer Science and Engineering, 
Pusan National University, 
Busan 46241, Korea 
Email; csha@pnu.edu