• Invitation
New Si-Based Materials for High-Tech Industry: 
New Challenge and Innovation

Invitation
Dear Colleagues,

On behalf of the organizing committee of the 2nd International Symposium on Applied Silicon Chemistry (ISASC-2), I am very pleased to invite you to attend the ISASC-2, which will be held at Korea Institute of Science and Technology (KIST) from the 24th to the 25th of October, 2013.

The theme of this upcoming ISASC-2, "New Si-Based Materials for High-Tech Industry: New Challenge and Innovation" has been chosen to provide an opportunity to have an insight into the outlook for the future in the field of Applied Silicon Chemistry. Plenary lectures along with the theme, invited lectures, and poster presentations in a variety of topics are being organized for the Symposium.

The symposium will also be an invaluable chance for participants to expand their network with professionals and distinguished invited lecturers from around the world. 

We would be grateful, if you would kindly accept our invitation to attend the Symposium.
We cordially invite you to ISASC-2, KIST, Korea in 2013.

Bok Ryul Yoo
Chairman of ISASC-2

Contact Information
Symposium Chair Dr. Bok Ryul Yoo
Korea Institute of Science and Technology
E-mail: bryoo@kist.re.kr    Phone: +82-2-958-5087     Fax: +82-2-958-5089

For general queries on ISASC-2: isasc@ksis.re.kr